[Lecture] Nanofabrication by nano-imprint and electron beam lithography and applications
author:nano-imprint and electron beam lithography and applications_CAMP NANO
CAMP NAN time:2012-04-24
TOPIC: Nanofabrication by nano-imprint and electron beam lithography and applications
SPEAKER: Prof. Bo Cui, Department of Electrical and Computer Engineering and Waterloo Institute for Nanotechnology (WIN), University of Waterloo, Canada
TIME: 10 am, Wednesday, April 25th
LOCATION: 215 meeting room, MSE building
ABSTRACT:
E-beam lithography (EBL) and nanoimprint lithography (NIL) are two most popular nanolithography techniques. EBL is based on material (called resist) property modification by its exposure to focused electron beam; whereas NIL relies on the mechanical conformation of a low viscosity resist to the structures of a mold. NIL offers high resolution (2nm), high throughput (up to one wafer/minute), low cost and high pattern transfer fidelity, though the mold has to be fabricated by the slow and expensive EBL. In the talk, I will first present our work on NIL using fluoro-polymer and hard/soft bi-layer mold that have advantages over conventional silicon mold. Then I will present EBL resist with a focus of polystyrene that can achieve ultra-high sensitivity or ultra-high resolution. Next, I will cover a few applications of nanostructures fabricated by NIL and EBL. They are: 1) study of cell-antibody interaction with the latter controlled by surface area of a pillar array structure; 2) employment of metallic nanostructures for chemical/bio-sensor based on surface enhanced Raman spectroscopy (SERS), and for the detection of DNA hybridization by surface plasmon resonance (SPR); 3) application of grating structure of polystyrene (biocompatible) for guided cell growth with a goal for tissue repair.
Bio of Prof. Bo Cui:
Bo Cui received B.S. degree in physics from Peking University, China, in 1994. After two years graduate study in the same department, he moved to University of Minnesota, then to Princeton University in 1998, where he earned his M.A. in 2000 and PhD in 2003 from the Nanostructure Laboratory (professor Stephen Y Chou), Department of Electrical Engineering. After his PhD, he joined the National Research Council of Canada, Industrial Materials Institute in Boucherville/Montreal in 2003. He left NRC in November 2008 and became an assistant professor at University of Waterloo.
He currently leads the Waterloo Nanofabrication Group. His research is focused on nano- and microstructure fabrication using nanoimprint lithography and electron beam lithography, and thin film deposition and etching, with device applications in biomedical and other areas. He has published over 40 peer-reviewed journal articles, two patents, two book chapters, as well as edited one book on nanofabrication. He is the assistant editor for the journal Nanoscale Research Letters. He is member of Optical Society of America, IEEE and American Vacuum Society.
