The Ethos SEM column is composed of a magnetic- and electrostatic-field compound objective lens system configured as two lens modes. High Resolution (HR) mode achieves sample observation at ultimate resolution by immersing the sample within the magnetic field of the lens system. Field Free(FF) mode offers real-time FIB processing for high accuracy end point milling. Hyper switching between FIB irradiation and SEM imaging as fast as 10 nsec offers real-time fabrication and observation views with clarity. Fast SEM and IM imaging enables users to quickly find the area of interest with ease.
NX5000 features
1. High-Performance FE-SEM Column with Dual Lens Mode
2. High-Throughput Material Processing
3. Triple-Beam Capable, Delivering Advanced Quality Results
4. Large Multi-Port Chamber and Stage for Various Applications
Specification |
FIB |
SIM resolution |
4 nm @ 30 kV 60 nm @ 2 kV (Edge resolution) |
Accelerating voltage |
0.5 kV - 30 kV |
Beam current |
100 nA |
Ion source |
Ga Liquid Metal Ion Source |
SEM |
SEM resolution |
1.5 nm @ 1 kV, 0.7 nm @ 15 kV |
Accelerating voltage |
0.1 kV - 30 kV |
Max. beam current |
10 nA |
Electron source |
Cold cathode field emission |
Detectors
|
In-column secondary electron detector, SE (U) In-column backscattered electron detector, BSE (U) In-column backscattered electron detector, BSE (L) Chamber mounted secondary electron detector, SE (L) |
5-axis motorized stage (with feedback control) |
X |
155 mm |
Y |
155 mm |
Z |
16.5 mm |
R |
0 ~360° |
T |
-10 ~ 59° |